ESPACER™ is an aqueous solution without any organic solvent. It’s a weak acidic solution, which is applicable for both type of resist. A material used to form a removable conductive polymer film on the surface of substrates such as semiconductor wafers and glass. The resulting coating exhibits high electrical conductivity.

A thin film of ESPACER™ is highly conductive, therefore it solves problems related to positional errors during electron-beam (EB) lithography processes.

• Used as a film for Electrification Dissipating Material this contains the original conducting polymer.
• The thin film of ESPACER™ has a high conductivity; therefore, it solves the problem about the positional error on the electron-beam (EB) lithography process.
• No adverse effect on resolution of resists.
• Can be applied not only onto conventional resists but also onto chemically amplified resists.
• Easily forms a thin conductive film using a spin coater.
• There are cases where it can protect the resist as an acidic polymer film.
• The spun film has sufficient heat resistance in practical uses.
• Water alone is used as solvent.
• It has neither a flash point, nor an ignition point, nor flammable limits.
• The conductive film can be easily removed by rinsing with water.

Applications: Charge-up prevention in electron beam lithography

Images Showing the Charge-Up Prevention Effect During Electron Beam Lithography